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Multi-wafer ALD

Country/Region china
Company Jiaxing Ke-micro limited
Categories Wafer Production Line
Telephone 0573-82583399
ICP License Issued by the Chinese Ministry
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Multi-wafer ALD

System Introduction

KMT-500S Atomic Layer Deposition System I a fully automatic, productive, single-chamber system specially developed for middle-scale experiments of industrialization. Equipped with standard deposition process configuration, the system satisfies the demand of industry application.

Product benefit

Advanced software controlling system: many functions are integrated in the system, including technological formulation, parameter setting, popedom stetting ,interlocking alarming ad state supervisory control.

Technical specifications

Wafer Dimension

8 inch and below

Wafer temperature

RT-500,Controlling precision ±0.1

Number of precursor

Two precursor lines,optional more lines

Temperature of precursor lines

RT-200,Controlling precision ±0.1

ALD Valve

Swagelok ALD swift valve

Background vacuum

<5*10-3Torr

Gas carrier system

N2 or Ar

Growing mode

Consecutive or interval deposition mode

Controlling system

PLC plus touch screen or display

Power supply

50-60Hz,380V/40A AC

Depositon Heterogeneity

Inside ship±1%,between chip ±1.5%

Thoughput capacity

500 wafers of 8 inch

Process time

5 s/cycle

Dimension of the instrument

1400mmx800mmx2000mm

ALD Films

Elementary substance: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe…

Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN …

Quality Multi-wafer ALD for sale
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