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Multi-wafer ALD

Country/Region china
Company Jiaxing Ke-micro limited
Categories Wafer Production Line
Telephone 0573-82583399
ICP License Issued by the Chinese Ministry
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Multi-wafer ALD

System Introduction

KMT-500S Atomic Layer Deposition System I a fully automatic, productive, single-chamber system specially developed for middle-scale experiments of industrialization. Equipped with standard deposition process configuration, the system satisfies the demand of industry application.

Product benefit

Advanced software controlling system: many functions are integrated in the system, including technological formulation, parameter setting, popedom stetting ,interlocking alarming ad state supervisory control.

Technical specifications

Wafer Dimension

8 inch and below

Wafer temperature

RT-500,Controlling precision ±0.1

Number of precursor

Two precursor lines,optional more lines

Temperature of precursor lines

RT-200,Controlling precision ±0.1

ALD Valve

Swagelok ALD swift valve

Background vacuum


Gas carrier system

N2 or Ar

Growing mode

Consecutive or interval deposition mode

Controlling system

PLC plus touch screen or display

Power supply

50-60Hz,380V/40A AC

Depositon Heterogeneity

Inside ship±1%,between chip ±1.5%

Thoughput capacity

500 wafers of 8 inch

Process time

5 s/cycle

Dimension of the instrument


ALD Films

Elementary substance: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe…

Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN …

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